Laser-induced fluorescence of fused silica irradiated by ArF excimer laser

Qihong Lou; Haibo Zhang; Zhijun Yuan; Jun Zhou

doi:10.1117/12.910377

12 January 2012 Laser-induced fluorescence of fused silica irradiated by ArF excimer laser

Qihong Lou, Haibo Zhang, Zhijun Yuan, Jun Zhou

Proceedings Volume 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers; 820607 (2012) https://doi.org/10.1117/12.910377
Event: Pacific Rim Laser Damage Symposium: Optical Materials for High Power Lasers, 2011, Shanghai, China

Abstract

Laser-induced fluorescence (LIF) of high-purity fused silica irradiated by ArF excimer laser is studied experimentally. LIF bands of the fused silica centered at 281nm, 478nm and 650nm are observed simultaneously. Furthermore, the angular distribution of the three fluorescence peaks is examined. Microscopic image of the laser modified fused silica indicates that scattering of the generated fluorescence by laser-induced damage sites is the main reason for the angular distribution of LIF signals. Finally, the dependence of LIF signals intensities of the fused silica on laser power densities is presented. LIF signals show a squared power density dependence, which indicates that laser-induced defects are formed mainly via two-photon absorption processes.

Citation Download Citation

Qihong Lou, Haibo Zhang, Zhijun Yuan, and Jun Zhou "Laser-induced fluorescence of fused silica irradiated by ArF excimer laser", Proc. SPIE 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers, 820607 (12 January 2012); https://doi.org/10.1117/12.910377

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