12 January 2012 Research for ultra-short pulse ablation of dielectric film mirror
Author Affiliations +
Proceedings Volume 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers; 82060V (2012) https://doi.org/10.1117/12.910257
Event: Pacific Rim Laser Damage Symposium: Optical Materials for High Power Lasers, 2011, Shanghai, China
In high-power laser system, in order to extend the components' service life and reduce the operation costs, more attentions should be pay at the research for damages ablation at multi-layer optical components and other high load optical components. 240ps, 35ps, 6ps 1053nm laser pulses has been used to investigate damage ablation and damage resistant experiments at 0° high reflection films. By comparing the damage morphology and damage resistant threshold of the ablation pits at different pulses width, it was superior to use ultra-short pulse to repair multi-layers optical components. It was found that the shorter pulse width has been used, the higher the damage resistant threshold and the lower the laser modulation. Furthermore, the finite-difference time-domain method was used to simulate the electric-field intensification within the large size damage region of multilayer films.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhimin Xiong, Zhimin Xiong, Panzheng Zhang, Panzheng Zhang, Youen Jiang, Youen Jiang, Xiaochao Wang, Xiaochao Wang, Dajie Huang, Dajie Huang, Wei Fan, Wei Fan, Xuechun Li, Xuechun Li, } "Research for ultra-short pulse ablation of dielectric film mirror", Proc. SPIE 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers, 82060V (12 January 2012); doi: 10.1117/12.910257; https://doi.org/10.1117/12.910257


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