Fabrication of microstructures with continuous surface profiles and very large sag heights by laser lithography

Jens Dunkel; Frank Wippermann; Andreas Bräuer

doi:10.1117/12.907337

6 February 2012 Fabrication of microstructures with continuous surface profiles and very large sag heights by laser lithography

Jens Dunkel, Frank Wippermann, Andreas Bräuer

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Proceedings Volume 8248, Micromachining and Microfabrication Process Technology XVII; 824807 (2012) https://doi.org/10.1117/12.907337
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States

Abstract

The fabrication of microstructures with continuous surface profiles and very large sag heights by a laser lithographic process on a commercially available laser lithography system is presented. The fabricated structures possess sag heights up to 60 μm with a pitch of 400 μm. Fabrication imperfections due to nonlinearities in the photoresist response and the isotropy of the development process have been compensated in the exposure data to minimize profile deviations. Therefore, an empirical process model is proposed based on experimentally determined development rates. The achievable accuracy of the data pre shape and exposure method as well as their limitations are discussed.

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Jens Dunkel, Frank Wippermann, and Andreas Bräuer "Fabrication of microstructures with continuous surface profiles and very large sag heights by laser lithography", Proc. SPIE 8248, Micromachining and Microfabrication Process Technology XVII, 824807 (6 February 2012); https://doi.org/10.1117/12.907337

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KEYWORDS

Photoresist materials

Lithography

Photoresist developing

Process modeling

Nitrogen

Photoresist baking

Algorithm development

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