8 February 2012 Rolling mask nanolithography: the pathway to large area and low cost nanofabrication
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Proceedings Volume 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V; 82490O (2012); doi: 10.1117/12.910158
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States
Abstract
The demand for large area and low cost nanopatterning techniques for optical coatings and photonic devices has increased at a tremendous rate. At present, it is clear that currently available nanopatterning technologies are unable to meet the required performance, fabrication-speed, or cost criteria for many applications requiring large area and low cost nanopatterning. Rolith Inc proposes to use a new nanolithography method - "Rolling mask" lithography - that combines the best features of photolithography, soft lithography and roll-to-plate printing technologies. We will report on the first results achieved on a recently built prototype tool and cylindrical mask, which was designed to pattern 300 mm wide substrate areas.
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Boris Kobrin, Edward S. Barnard, Mark L. Brongersma, Moon Kyu Kwak, L. Jay Guo, "Rolling mask nanolithography: the pathway to large area and low cost nanofabrication", Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490O (8 February 2012); doi: 10.1117/12.910158; https://doi.org/10.1117/12.910158
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KEYWORDS
Photomasks

Nanolithography

Lithography

Nanostructures

Nanostructuring

Printing

Near field

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