Programmed resist sidewall profiles using subresolution binary grayscale masks for Si-photonics applications

Ofir Gan; Paul Allen; Assia Barkai; Peter Buck; Brid Connolly; Harel Frish; Massimiliano Pindo

doi:10.1117/12.907275

14 February 2012 Programmed resist sidewall profiles using subresolution binary grayscale masks for Si-photonics applications

Ofir Gan, Paul Allen, Assia Barkai, Peter Buck, Brid Connolly, Harel Frish, Massimiliano Pindo

Author Affiliations +

Proceedings Volume 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V; 82490W (2012) https://doi.org/10.1117/12.907275
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States

Abstract

In this paper we present a 45-degree mirror created for optical applications utilizing CMOS high-volume manufacturing processes with a gray-scale lithography technique. The process that is presented here was done by creating a 3D pattern in the photoresist and then by transferring the photoresist profile to the Si/SiO₂ substrate by specific dry etch processing. We discuss the optimization of the half-tone pattern to achieve the desired resist profile. We achieved smooth sidewalls with various sidewall angles and show that different 3D angles and profiles can be achieved and processed simultaneously.

Citation Download Citation

Ofir Gan, Paul Allen, Assia Barkai, Peter Buck, Brid Connolly, Harel Frish, and Massimiliano Pindo "Programmed resist sidewall profiles using subresolution binary grayscale masks for Si-photonics applications", Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490W (14 February 2012); https://doi.org/10.1117/12.907275

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