15 February 2012 Modeling and simulation of the surface profile forming process for optimum control of the lithographically fabricated microlenses and lens arrays
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Proceedings Volume 8252, MOEMS and Miniaturized Systems XI; 82520R (2012) https://doi.org/10.1117/12.912520
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States
Abstract
Numerical tools have been widely used in the simulations of the exposure, the post-exposure bake, and the development processes in lithography of thick photoresist. Three-dimensional (3D) cellular automata (CA) model has also been successfully introduced for resist etching process simulation in recent years. In this paper, we report a 3D CA model to simulate the formation process of the surface profile of out-of-plane microlens fabricated using ultraviolet (UV) lithography of thick SU-8 resist. The simulation results were compared with experimental results. The comparison shows that the 3D CA model can be used to simulate the complicated surface formation process of the microlenses during the development process.
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Zhengyu Miao, Wanjun Wang, "Modeling and simulation of the surface profile forming process for optimum control of the lithographically fabricated microlenses and lens arrays", Proc. SPIE 8252, MOEMS and Miniaturized Systems XI, 82520R (15 February 2012); doi: 10.1117/12.912520; https://doi.org/10.1117/12.912520
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