Engineering high harmonic generation in semiconductors via pulse shaping

Matthias Reichelt; Andre Hildebrandt; Andrea Walther; Jens Förstner; Torsten Meier

doi:10.1117/12.906338

20 February 2012 Engineering high harmonic generation in semiconductors via pulse shaping

Matthias Reichelt, Andre Hildebrandt, Andrea Walther, Jens Förstner, Torsten Meier

Proceedings Volume 8260, Ultrafast Phenomena and Nanophotonics XVI; 82601L (2012) https://doi.org/10.1117/12.906338
Event: SPIE OPTO, 2012, San Francisco, California, United States

Abstract

High harmonic generation is investigated for a two-band model of a semiconductor nanostructure. Similar to an atomic two-level system, the semiconductor emits high harmonic radiation. We show how one can specifically enhance the emission for a given frequency by applying a non-trivially shaped laser pulse. Therefore, the semiconductor Bloch equations including the interband and additionally the intraband dynamics are solved numerically and the spectral shape of the input pulse is computed via an optimization algorithm. It is demonstrated that desired emission frequencies can be favored even though the overall input power is kept constant. We also suggest special metallic nano geometries to achieve enhanced localized optical fields. They are found by geometric optimization.

Citation Download Citation

Matthias Reichelt, Andre Hildebrandt, Andrea Walther, Jens Förstner, and Torsten Meier "Engineering high harmonic generation in semiconductors via pulse shaping", Proc. SPIE 8260, Ultrafast Phenomena and Nanophotonics XVI, 82601L (20 February 2012); https://doi.org/10.1117/12.906338

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