Fabrication and characterization of parallel-coupled dual racetrack silicon microresonators

Ryan A. Integlia; Lianghong Yin; Duo Ding; David Z. Pan; Douglas M. Gill; Weiwei Song; Ying Qian; Wei Jiang

doi:10.1117/12.908601

23 February 2012 Fabrication and characterization of parallel-coupled dual racetrack silicon microresonators

Ryan A. Integlia, Lianghong Yin, Duo Ding, David Z. Pan, Douglas M. Gill, Weiwei Song, Ying Qian, Wei Jiang

Proceedings Volume 8266, Silicon Photonics VII; 82660M (2012) https://doi.org/10.1117/12.908601
Event: SPIE OPTO, 2012, San Francisco, California, United States

Abstract

Parallel-coupled dual racetrack micro-resonator structures have potential applications for quadrature amplitude modulation. Fabrication of parallel-coupled dual racetrack silicon micro-resonators was conducted, while overcoming for some barriers to fabrication. Fabrication process limitations and design considerations are discussed. Fabrication results are presented. Some barriers to fabrication include stitching and overdosing in electron beam lithography. A multi-input and output test bed with optical and electrical control was necessary for device characterization. The characterization of the fabricated devices is presented, along with the related procedures. Some of the tests performed are wavelength scans and top surface scans.

Citation Download Citation

Ryan A. Integlia, Lianghong Yin, Duo Ding, David Z. Pan, Douglas M. Gill, Weiwei Song, Ying Qian, and Wei Jiang "Fabrication and characterization of parallel-coupled dual racetrack silicon microresonators", Proc. SPIE 8266, Silicon Photonics VII, 82660M (23 February 2012); https://doi.org/10.1117/12.908601

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