2 February 2012 Soft lithography fabricated polymer waveguides and 45° inclined mirrors for card-to-backplane optical interconnects
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Proceedings Volume 8267, Optoelectronic Interconnects XII; 82670R (2012) https://doi.org/10.1117/12.908243
Event: SPIE OPTO, 2012, San Francisco, California, United States
Abstract
Polymer waveguides with 45° mirrors are fabricated by vacuum assisted microfluidic (VAM) soft lithographic technique for card-to-backplane optical interconnect applications. Waveguide array structures with inclined surfaces in SU-8 photoresist for PDMS mold are fabricated by prism assisted UV exposure. Sample surface reflected UV light is utilized to eliminate undercut structures and to accomplish the inclined mirror surfaces on both ends of the straight waveguide segments by one-step UV exposure. Polymer waveguides with 45° embedded mirrors demonstrated about 0.49 dB/cm propagation loss and 67% mirror coupling efficiency.
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Guomin Jiang, Sarfaraz Baig, Michael R. Wang, "Soft lithography fabricated polymer waveguides and 45° inclined mirrors for card-to-backplane optical interconnects", Proc. SPIE 8267, Optoelectronic Interconnects XII, 82670R (2 February 2012); doi: 10.1117/12.908243; https://doi.org/10.1117/12.908243
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