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17 December 2011 Design and fabrication of photonic crystals in epitaxial-free silicon for ultrathin solar cells
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Proceedings Volume 8312, Display, Solid-State Lighting, Photovoltaics, and Optoelectronics in Energy III; 831207 (2011) https://doi.org/10.1117/12.904383
Event: SPIE/OSA/IEEE Asia Communications and Photonics, 2011, Shanghai, China
Abstract
In this paper, we present the integration of an absorbing photonic crystal within a thin film photovoltaic solar cell. Optical simulations performed on a complete solar cell revealed that patterning the epitaxial crystalline silicon active layer as a 1D and 2D photonic crystal enabled to increase its integrated absorption by 37%abs and 68%absbetween 300 nm and 1100 nm, compared to a similar but unpatterned stack. In order to fabricate such promising cells, a specific fabrication processes based on holographic lithography, inductively coupled plasma etching and reactive ion etching has been developed and implemented to obtain ultrathin patterned solar cells.
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Xianqin Meng, Valerie Depauw, Guillaume Gomard, Ounsi El Daif, Christos Trompoukis, Emmanuel Drouard, Alain Fave, Frederic Dross, Ivan Gordon, and Christian Seassal "Design and fabrication of photonic crystals in epitaxial-free silicon for ultrathin solar cells", Proc. SPIE 8312, Display, Solid-State Lighting, Photovoltaics, and Optoelectronics in Energy III, 831207 (17 December 2011); https://doi.org/10.1117/12.904383
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