Optical performance of LPP multilayer collector mirrors

Torsten Feigl; Marco Perske; Hagen Pauer; Tobias Fiedler; Sergiy Yulin; Marcus Trost; Sven Schröder; Angela Duparré; Norbert Kaiser; Andreas Tünnermann; Norbert R. Böwering; Alex I. Ershov; Kay Hoffmann; Bruno La Fontaine; Kevin D. Cummings

doi:10.1117/12.919735

23 March 2012 Optical performance of LPP multilayer collector mirrors

Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Sergiy Yulin, Marcus Trost, Sven Schröder, Angela Duparré, Norbert Kaiser, Andreas Tünnermann, Norbert R. Böwering, Alex I. Ershov, Kay Hoffmann, Bruno La Fontaine, Kevin D. Cummings

Author Affiliations +

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 832217 (2012) https://doi.org/10.1117/12.919735
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

The usable power and the collector optics lifetime of high-power extreme ultraviolet light sources at 13.5 nm are considered as the major challenges in the transitioning of EUV lithography from the current pre-production phase to high volume manufacturing. We give a detailed performance summary of the large ellipsoidal multilayer collector mirrors used in Cymer's laser-produced plasma extreme ultraviolet light sources. In this paper we present the optical performance - reflectance and wavelength - of the multilayer-coated ellipsoidal collectors as well as a novel approach for the roughness characterization of large EUV mirror optics based on light scattering measurements at 442 nm. We also describe the optical performance and characteristics during operation of the light source and the substantial increase of collector lifetime by the implementation of new coating designs.

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Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Sergiy Yulin, Marcus Trost, Sven Schröder, Angela Duparré, Norbert Kaiser, Andreas Tünnermann, Norbert R. Böwering, Alex I. Ershov, Kay Hoffmann, Bruno La Fontaine, and Kevin D. Cummings "Optical performance of LPP multilayer collector mirrors", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832217 (23 March 2012); https://doi.org/10.1117/12.919735

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