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23 March 2012 Model calibration and validation for pre-production EUVL
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Abstract
As Extreme Ultraviolet Lithography (EUVL) enters the pre-production phase, the need to qualify the Electronic Design Automation (EDA) infrastructure is pressing. In fact, it is clear that EUV will require optical proximity correction (OPC), having its introduction shifted to more advanced technology nodes. The introduction of off-axis illumination will enlarge the optical proximity effects, and EUV-specific effects such as flare and shadowing have to be fully integrated in the correction flow and tested. We have performed a model calibration exercise on the ASML NXE:3100 pre-production EUVL scanner using Brion's Tachyon NXE EUV system. A model calibration mask has been designed, manufactured and characterized. The mask has different flare levels, as well as model calibration structures through CDs and pitch. The flare modulation through the mask is obtained by varying tiling densities. The generation of full-chip flare maps has been qualified against experimental results. The model was set up and calibrated on an intermediate flare level, and validated in the full flare range. Wafer data have been collected and were used as input for model calibration and validation. Two-dimensional structures through CD and pitch were used for model calibration and verification. We discuss in detail the EUV model, and analyze its various components, with particular emphasis to EUV-specific phenomena such as flare and shadowing.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gian F. Lorusso, Jeroen Van de Kerkhove, Peter De Bisschop, Eric Hendrickx, J. Jiang, D. Rio, W. Liu, and H. Liu "Model calibration and validation for pre-production EUVL", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83221L (23 March 2012); https://doi.org/10.1117/12.916762
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