Study of actinic dark-field inspection with programmed amplitude defects

Noriaki Takagi; Takeshi Yamane; Yukiyasu Arisawa; Tsuneo Terasawa

doi:10.1117/12.916320

23 March 2012 Study of actinic dark-field inspection with programmed amplitude defects

Noriaki Takagi, Takeshi Yamane, Yukiyasu Arisawa, Tsuneo Terasawa

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 832235 (2012) https://doi.org/10.1117/12.916320
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

In this work, a simulation for actinic dark-field inspection with amplitude defects was carried out. The simulation was then followed by experiments on actinic dark-field inspection with programmed amplitude defects. For this experiment, the programmed amplitude defects were fabricated using EB exposure. The simulated result showed that the intensity signal was influenced by the thickness and width of the amplitude defect. The simulated results were then confirmed by the experiments. The tendency of the result was approximately similar to the simulated results. However, the dependency on the two factors of defect thickness and defect width is not similar to the simulated results. As the factors of difference, difference of defect edge angle and element of defect model expected.

Citation Download Citation

Noriaki Takagi, Takeshi Yamane, Yukiyasu Arisawa, and Tsuneo Terasawa "Study of actinic dark-field inspection with programmed amplitude defects", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832235 (23 March 2012); https://doi.org/10.1117/12.916320

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