Paper
21 March 2012 Synthesis and characterization of self-assembling block copolymers containing fluorine groups
Rina Maeda, Michelle Chavis, Nam-Ho You, Christopher K. Ober
Author Affiliations +
Abstract
The fluorine-containing block copolymers of poly(styrene-block-2,2,2-trifluoroethyl methacrylate) (PS-b-PTFEMA) and poly(4-hydroxystyrene-block-2,2,2-trifluoroethyl methacrylate) (PHOST-b-PTFEMA), which all are capable of both top-down and bottom-up lithography were developed. The reported block copolymers were synthesized by either anionic polymerization or atom transfer radical polymerization (ATRP). Characterization of bulk and thin films were carried out using differential scanning calorimetry (DSC), transmission electron microscopy (TEM) and small angle X-ray scattering (SAXS). Thin films of the resulting block copolymers were subjected to conventional lithographic processing using e-beam and deep-UV radiation to create integrated patterns such as dots in lines.
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Rina Maeda, Michelle Chavis, Nam-Ho You, and Christopher K. Ober "Synthesis and characterization of self-assembling block copolymers containing fluorine groups", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230E (21 March 2012); https://doi.org/10.1117/12.916418
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KEYWORDS
Polymerization

Lithography

Thin films

Transmission electron microscopy

Polymers

Electron beam lithography

Deep ultraviolet

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