16 April 2012 Directed self-assembly defectivity assessment. Part II
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Abstract
The main concern for the commercialization of directed self-assembly (DSA) for semiconductor manufacturing continues to be the uncertainty in capability and control of defect density. Our research investigates the defect densities of various DSA process applications in the context of a 300mm wafer fab cleanroom environment; this paper expands substantially on the previously published DSA defectivity study by reporting a defect density process window relative to chemical epitaxial pre-pattern registration lines; as well as investigated DSA based contact hole shrinking and report critical dimension statistics for the phase separated polymers before and after etch, along with positional accuracy measurements and missing via defect density.
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Chris Bencher, Chris Bencher, He Yi, He Yi, Jessica Zhou, Jessica Zhou, Manping Cai, Manping Cai, Jeffrey Smith, Jeffrey Smith, Liyan Miao, Liyan Miao, Ofir Montal, Ofir Montal, Shiran Blitshtein, Shiran Blitshtein, Alon Lavi, Alon Lavi, Kfir Dotan, Kfir Dotan, Huixiong Dai, Huixiong Dai, Joy Y. Cheng, Joy Y. Cheng, Daniel P. Sanders, Daniel P. Sanders, Melia Tjio, Melia Tjio, Steven Holmes, Steven Holmes, } "Directed self-assembly defectivity assessment. Part II", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230N (16 April 2012); doi: 10.1117/12.917993; https://doi.org/10.1117/12.917993
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