21 March 2012 Imprint process performance for patterned media at densities greater than 1Tb/in2
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Abstract
The use of bit pattern media beyond densities of 1Tb/in2 requires the ability to pattern dimensions to sub 10nm. This paper describes the techniques used to reach these dimensions with imprint lithography and avoid such challenges as pattern collapse, by developing improved resist materials with higher strength, and utilizing a reverse tone J-FIL/R process.
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Zhengmao Ye, Scott Carden, Paul Hellebrekers, Dwayne LaBrake, Douglas J. Resnick, M. Melliar-Smith, S. V. Sreenivasan, "Imprint process performance for patterned media at densities greater than 1Tb/in2", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230V (21 March 2012); doi: 10.1117/12.918042; https://doi.org/10.1117/12.918042
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