Contact-hole patterning for random logic circuits using block copolymer directed self-assembly

He Yi; Xin-Yu Bao; Jie Zhang; Richard Tiberio; James Conway; Li-Wen Chang; Subhasish Mitra; H.-S. Philip Wong

doi:10.1117/12.912804

21 March 2012 Contact-hole patterning for random logic circuits using block copolymer directed self-assembly

He Yi, Xin-Yu Bao, Jie Zhang, Richard Tiberio, James Conway, Li-Wen Chang, Subhasish Mitra, H.-S. Philip Wong

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 83230W (2012) https://doi.org/10.1117/12.912804
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Block copolymer directed self-assembly (DSA) is a promising extension of optical lithography for device fabrication akin to double-patterning. The irregular distribution of contact holes in circuit layouts is one of the biggest challenges for DSA patterning because the self-assembly tends to form regular patterns naturally. Although the small guiding templates are shown to guide the self-assembly off the natural geometry by strong boundary confinement [1, 2] (Fig. 1), it is insufficient to simply surround contact holes with guiding templates without optimizing the placement and geometry of the guiding templates.

Citation Download Citation

He Yi, Xin-Yu Bao, Jie Zhang, Richard Tiberio, James Conway, Li-Wen Chang, Subhasish Mitra, and H.-S. Philip Wong "Contact-hole patterning for random logic circuits using block copolymer directed self-assembly", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230W (21 March 2012); https://doi.org/10.1117/12.912804

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