21 March 2012 Contact-hole patterning for random logic circuits using block copolymer directed self-assembly
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Abstract
Block copolymer directed self-assembly (DSA) is a promising extension of optical lithography for device fabrication akin to double-patterning. The irregular distribution of contact holes in circuit layouts is one of the biggest challenges for DSA patterning because the self-assembly tends to form regular patterns naturally. Although the small guiding templates are shown to guide the self-assembly off the natural geometry by strong boundary confinement [1, 2] (Fig. 1), it is insufficient to simply surround contact holes with guiding templates without optimizing the placement and geometry of the guiding templates.
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He Yi, Xin-Yu Bao, Jie Zhang, Richard Tiberio, James Conway, Li-Wen Chang, Subhasish Mitra, and H.-S. Philip Wong "Contact-hole patterning for random logic circuits using block copolymer directed self-assembly", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230W (21 March 2012); doi: 10.1117/12.912804; https://doi.org/10.1117/12.912804
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