21 March 2012 REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography
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Abstract
REBL (Reflective Electron Beam Lithography) is a novel concept for high speed maskless projection electron beam lithography. Originally targeting 45 nm HP (half pitch) under a DARPA funded contract, we are now working on optimizing the optics and architecture for the commercial silicon integrated circuit fabrication market at the equivalent of 16 nm HP. The shift to smaller features requires innovation in most major subsystems of the tool, including optics, stage, and metrology. We also require better simulation and understanding of the exposure process. In order to meet blur requirements for 16 nm lithography, we are both shrinking the pixel size and reducing the beam current. Throughput will be maintained by increasing the number of columns as well as other design optimizations. In consequence, the maximum stage speed required to meet wafer throughput targets at 16 nm will be much less than originally planned for at 45 nm. As a result, we are changing the stage architecture from a rotary design to a linear design that can still meet the throughput requirements but with more conventional technology that entails less technical risk. The linear concept also allows for simplifications in the datapath, primarily from being able to reuse pattern data across dies and columns. Finally, we are now able to demonstrate working dynamic pattern generator (DPG) chips, CMOS chips with microfabricated lenslets on top to prevent crosstalk between pixels.
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Mark A. McCord, Paul Petric, Upendra Ummethala, Allen Carroll, Shinichi Kojima, Luca Grella, Sameet Shriyan, Charles T. Rettner, Chris F. Bevis, "REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832311 (21 March 2012); doi: 10.1117/12.919744; https://doi.org/10.1117/12.919744
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