21 March 2012 Controlling template erosion with advanced cleaning methods
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Abstract
We studied the erosion and feature stability of fused silica patterns under different template cleaning conditions. The conventional SPM cleaning is compared with an advanced non-acid process. Spectroscopic ellipsometry optical critical dimension (SE-OCD) measurements were used to characterize the changes in pattern profile with good sensitivity. This study confirmed the erosion of the silica patterns in the traditional acid-based SPM cleaning mixture (H2SO4+H2O2) at a rate of ~0.1nm per cleaning cycle. The advanced non-acid clean process however only showed CD shift of ~0.01nm per clean. Contamination removal & pattern integrity of sensitive 20nm features under MegaSonic assisted cleaning is also demonstrated.
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SherJang Singh, SherJang Singh, Zhaoning Yu, Zhaoning Yu, Tobias Wähler, Tobias Wähler, Nobuo Kurataka, Nobuo Kurataka, Gene Gauzner, Gene Gauzner, Hongying Wang, Hongying Wang, Henry Yang, Henry Yang, Yautzong Hsu, Yautzong Hsu, Kim Lee, Kim Lee, David Kuo, David Kuo, Peter Dress, Peter Dress, } "Controlling template erosion with advanced cleaning methods", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832317 (21 March 2012); doi: 10.1117/12.916294; https://doi.org/10.1117/12.916294
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