21 March 2012 Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment
Author Affiliations +
Abstract
To keep on with scaling down of nanoelectronic components novel lithographic approaches are required. The direct, positive-tone lithography of calixarene molecular resists by scanning probe techniques represents a promising alternative for ease-of-use sub-10 nm mask-less lithography. Herein, we demonstrate a closed loop tip-based nanolithography using the same nanoprobe for: (i) AFM pre-imaging for pattern overlay alignment; (ii) direct writing of features into calixarene molecular resist applying a highly confined, development-less removal process; and (iii) AFM post-imaging as final in-situ inspection. In addition, we demonstrate parallel writing capabilities by employing multi nano-tip probes. By using these methods we can drastically enhance the attractiveness of calixarene molecular resist as development-less, high resolution resist material for Scanning Probe Lithography (SPL).
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Kaestner, I. W. Rangelow, "Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231G (21 March 2012); doi: 10.1117/12.916263; https://doi.org/10.1117/12.916263
PROCEEDINGS
9 PAGES


SHARE
Back to Top