21 March 2012 Sub-100 nm pattern formation by roll-to-roll nanoimprint
Author Affiliations +
Abstract
Technologies for pattern fabrication on a flexible substrate are being developed for various flexible devices. A patterning technique for a smaller pattern of the order of sub-100 nm will be needed in the near future. Roll-to-roll Nano-Imprint Lithography (RtR-NIL) is promising candidate for extremely low-cost fabrication of large-area devices in large volumes. We have tried to transfer sub-100 nm patterns, especially sub-30 nm patterns, onto ultraviolet (UV) curable resin on film substrate by RtR-NIL. We demonstrate a 24 nm pattern on a film substrate by RtR-NIL and the method's potential for sub-100 nm patterning.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryoichi Inanami, Ryoichi Inanami, Tomoko Ojima, Tomoko Ojima, Kazuto Matsuki, Kazuto Matsuki, Takuya Kono, Takuya Kono, Tetsuro Nakasugi, Tetsuro Nakasugi, } "Sub-100 nm pattern formation by roll-to-roll nanoimprint", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231J (21 March 2012); doi: 10.1117/12.916584; https://doi.org/10.1117/12.916584
PROCEEDINGS
8 PAGES


SHARE
Back to Top