21 March 2012 Roll-to-roll nanopatterning using jet and flash imprint lithography
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Abstract
The ability to pattern materials at the nanoscale can enable a variety of applications ranging from high density data storage, displays, photonic devices and CMOS integrated circuits to emerging applications in the biomedical and energy sectors. These applications require varying levels of pattern control, short and long range order, and have varying cost tolerances. Extremely large area R2R manufacturing on flexible substrates is ubiquitous for applications such as paper and plastic processing. It combines the benefits of high speed and inexpensive substrates to deliver a commodity product at low cost. The challenge is to extend this approach to the realm of nanopatterning and realize similar benefits. The cost of manufacturing is typically driven by speed (or throughput), tool complexity, cost of consumables (materials used, mold or master cost, etc.), substrate cost, and the downstream processing required (annealing, deposition, etching, etc.). In order to achieve low cost nanopatterning, it is imperative to move towards high speed imprinting, less complex tools, near zero waste of consumables and low cost substrates. The Jet and Flash Imprint Lithography (J-FILTM) process uses drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry etch pattern transfer. The technology is actively being used to develop solutions for memory markets including Flash memory and patterned media for hard disk drives. In this paper we address the key challenges for roll based nanopatterning by introducing a novel concept: Ink Jet based Roll-to-Roll Nanopatterning. To address this challenge, we have introduced a J-FIL based demonstrator product, the LithoFlex 100. Topics that are discussed in the paper include tool design and process performance. In addition, we have used the LithoFlex 100 to fabricate high performance wire grid polarizers on flexible polycarbonate (PC) films. Transmission of better than 80% and extinction ratios on the order of 4500 have been achieved.
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Sean Ahn, Sean Ahn, Maha Ganapathisubramanian, Maha Ganapathisubramanian, Mike Miller, Mike Miller, Jack Yang, Jack Yang, Jin Choi, Jin Choi, Frank Xu, Frank Xu, Douglas J. Resnick, Douglas J. Resnick, S. V. Sreenivasan, S. V. Sreenivasan, } "Roll-to-roll nanopatterning using jet and flash imprint lithography", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231L (21 March 2012); doi: 10.1117/12.918040; https://doi.org/10.1117/12.918040
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