EUVL compatible LER solutions using functional block copolymers

Han-Hao Cheng; Imelda Keen; Anguang Yu; Ya-Mi Chuang; Idriss Blakey; Kevin S. Jack; Michael J. Leeson; Todd R. Younkin; Andrew K. Whittaker

doi:10.1117/12.916744

Translator Disclaimer

21 March 2012 EUVL compatible LER solutions using functional block copolymers

Han-Hao Cheng, Imelda Keen, Anguang Yu, Ya-Mi Chuang, Idriss Blakey, Kevin S. Jack, Michael J. Leeson, Todd R. Younkin, Andrew K. Whittaker

Author Affiliations +

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 83231O (2012) https://doi.org/10.1117/12.916744
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Directed self assembly (DSA) of block copolymers is an emerging technology for achieving sub-lithographic resolution. We investigate the directed self assembly of two systems, polystyrene-block-poly-DL-lactic acid (PS-b-PDLA) and PSb- poly(methyl methacrylate). For the PS-b-PDLA system we use an open source EUVL resist and a commerciallyavailable underlayer to prepare templates for DSA. We investigate the morphology of the phase separated domains and compare the LER of the resist and the PS-PDLA interface. For the PS-b-PMMA system we again use an open source resist, but the annealing conditions in this case require crosslinking of the resist prior to deposition of the block copolymer. For this system we also investigate the morphology of the phase separated domains and compare the LER of the resist and the PS-PMMA interface.

Citation Download Citation

Han-Hao Cheng, Imelda Keen, Anguang Yu, Ya-Mi Chuang, Idriss Blakey, Kevin S. Jack, Michael J. Leeson, Todd R. Younkin, and Andrew K. Whittaker "EUVL compatible LER solutions using functional block copolymers", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231O (21 March 2012); https://doi.org/10.1117/12.916744

ACCESS THE FULL ARTICLE