21 March 2012 A phase segregating polymer blend for 2xnm feature applications
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Abstract
A phase segregating polymer blend comprising a SOD precursor polysilazane and an organic polymer PSαMS [poly(styrene-co-α-methyl styrene)] was studied. By utilizing similar approaches employed in DSA (directed self-assembly) such as patterned substrates, surface chemical modification etc and their combination, we achieved 2xnm spacer and airgap-like structure. Vertical phase separation and cylinder microdomains in the film of this blend can be straightforwardly observed by cross-section SEM (Scanning Electron Microscope) respectively. The airgap-like structure derived from cylinder microdomains was directly obtained on ArF resist pattern. Spacer derived from vertical phase separation was obtained on pretreated ArF resist pattern.
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Jin Li, Tatsuro Nagahara, Munirathna Padmanaban, John Sagan, "A phase segregating polymer blend for 2xnm feature applications", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231R (21 March 2012); doi: 10.1117/12.916031; https://doi.org/10.1117/12.916031
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