21 March 2012 Block co-polymer guided self-assembly by surface chemical modification: optimization of multiple patterning process and pattern transfer
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Abstract
Block co-polymer (BCP) lithography is becoming an established technique for patterning beyond optical lithography limitations. It is based on combining the intrinsic property of the block co-polymers to phase separate at the molecular scale with the capabilities of conventional top-down lithographic methods for patterning surfaces. Guiding the selfassembly of block co-polymers by surface chemical modification is one of the most used processes to drive the selfassembly in a convenient way. It consists on using lithography and oxygen plasma to create different wettability regions on a polymer brush grafted on the surface. For creating patterns with sub-22 nm resolution, this process introduces a tight restriction in the guiding lithography process. We present an easier guided self-assembly process by surface chemical modification that allows for a more relaxed guiding pattern specifications, providing a simpler route for the fabrication of nanometer scale structures.
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Lorea Oria, Lorea Oria, Alaitz Ruiz de Luzuriaga, Alaitz Ruiz de Luzuriaga, Juan A. Alduncín, Juan A. Alduncín, Francesc Pérez-Murano, Francesc Pérez-Murano, } "Block co-polymer guided self-assembly by surface chemical modification: optimization of multiple patterning process and pattern transfer", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832327 (21 March 2012); doi: 10.1117/12.916339; https://doi.org/10.1117/12.916339
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