21 March 2012 Feasibility study of character projection-based electron-beam direct writing for logic LSI wiring including automatically routed area with 14nm node technology case
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Abstract
Multi column cell (MCC) exposure system is a promising candidate for the next generation lithography tool. The concept of MCC is parallelization of the electron beam columns with character projection (CP) [1]. In this paper, we would like to describe current CP techniques being used for product manufacturing. We also would like to introduce CP based EBDW method to draw automatically routed wiring area with 14 nm node technology of 20nm half-pitch (hp) case. Pattern density influence for process margin and shot noise tolerance consideration are discussed. Feasibility study of the model character set for router generated wiring drawing is presented.
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Shinji Sugatani, Shinji Sugatani, Takashi Maruyama, Takashi Maruyama, Yoshinori Kojima, Yoshinori Kojima, Yasushi Takahashi, Yasushi Takahashi, Masaki Takakuwa, Masaki Takakuwa, Shuzo Ohshio, Shuzo Ohshio, Masaru Ito, Masaru Ito, } "Feasibility study of character projection-based electron-beam direct writing for logic LSI wiring including automatically routed area with 14nm node technology case", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832329 (21 March 2012); doi: 10.1117/12.916358; https://doi.org/10.1117/12.916358
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