3 April 2012 Ultrahigh 22-nm resolution EUV coherent diffraction imaging using a tabletop 13-nm high harmonic source
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Proceedings Volume 8324, Metrology, Inspection, and Process Control for Microlithography XXVI; 83240D (2012); doi: 10.1117/12.916524
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States
Abstract
We implement coherent diffractive imaging (CDI) using a phase-matched high-harmonic generation (HHG) source at 13 nm, demonstrating reconstructed images with a record 22 nm resolution for any tabletop, light-based microscope. We also demonstrate the first reflection-mode CDI using a compact extreme ultraviolet (EUV) source, achieving ≈100 nm resolution. A clear path towards even higher spatial resolution reflection-mode tabletop imaging using apertured-illumination schemes will be discussed.
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Matthew D. Seaberg, Daniel E. Adams, Bosheng Zhang, Dennis F. Gardner, Margaret M. Murnane, Henry C. Kapteyn, "Ultrahigh 22-nm resolution EUV coherent diffraction imaging using a tabletop 13-nm high harmonic source", Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83240D (3 April 2012); doi: 10.1117/12.916524; https://doi.org/10.1117/12.916524
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KEYWORDS
Extreme ultraviolet

Coherence imaging

Diffraction

Image resolution

Imaging systems

Phase retrieval

Spatial resolution

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