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5 April 2012 Automated SEM recipe generation for OPC applications
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This work presents software tools that enable engineers to make relevant SEM measurement decisions in the EDA environment, presented in the optimal context for the engineer, and pass them seamlessly into the SEM environment. We present the tools and interfaces leveraged in this solution and explore the benefits of enabling OPC modeling engineers to make metrology-related decisions within the OPC environment. New opportunities for automation of metrologyrelated OPC tasks are also discussed.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sylvain Berthiaume, Travis Brist, Peter Brooker, William Stanton, Brian Ward, Shimon Levi, and Amit Siany "Automated SEM recipe generation for OPC applications", Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83241W (5 April 2012);

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