Nanoemitter: ultra-high-resolution electron source for CD metrology

Sebastian W. Schmidt; Christian Penzkofer; Bernd Irmer

doi:10.1117/12.917629

5 April 2012 Nanoemitter: ultra-high-resolution electron source for CD metrology

Sebastian W. Schmidt, Christian Penzkofer, Bernd Irmer

Proceedings Volume 8324, Metrology, Inspection, and Process Control for Microlithography XXVI; 83242E (2012) https://doi.org/10.1117/12.917629
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Nanoemitters (NEs) are a promising replacement for electron sources in producing field emission CD-SEMs and CDTEMs. So far, NEs have been fabricated by, e.g. carbon nanotubes or nanowhiskers of conductive materials. Here, we present a new method to manufacture NEs using electron beam induced processing (EBIP) - a method well established in the nanofabrication of super sharp probes for scanning probe microscopy - and show their unique performance. NEs manufactured by EBIP combine a high density, diamond-like carbon core (HDC/DLC) with high aspect ratio and tip sharpness, and a highly conductive coating. The EBIP process allows for the batch-fabrication of NEs at larger scales with desired sharpness, shape, mechanical stability and conductivity. NEs, which can easily be mounted into existing SEM/TEM assemblies, have been operated for > 5.000 h without any sign of degradation at a comparatively constant beam current of 3 μA, wherein maximum current oscillations of 10% occurred, while current oscillations were less than 3% over a time span of several minutes. Due to the cold operating temperature and small tip radius, the resolution improved up to 30% compared to a standard Schottky thermal field emitter. The improvement is significant in the low voltage range below 5 kV.

Citation Download Citation

Sebastian W. Schmidt, Christian Penzkofer, and Bernd Irmer "Nanoemitter: ultra-high-resolution electron source for CD metrology", Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83242E (5 April 2012); https://doi.org/10.1117/12.917629

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available