Line-end gap measurement with YieldStar scatterometer: towards an OPC model calibration

A.-L. Charley; M. Dusa; T.-B. Chiou; P. Leray; S. Cheng; A. Fumar-Pici

doi:10.1117/12.918028

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5 April 2012 Line-end gap measurement with YieldStar scatterometer: towards an OPC model calibration

A.-L. Charley, M. Dusa, T.-B. Chiou, P. Leray, S. Cheng, A. Fumar-Pici

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Proceedings Volume 8324, Metrology, Inspection, and Process Control for Microlithography XXVI; 83242I (2012) https://doi.org/10.1117/12.918028
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Line-end gap measurement for OPC calibration is a challenge for metrology. Even for CD-SEM, the rounded shape of the line end makes it very difficult to measure precisely. We have presented preliminary results of the application of scatterometry to these challenging structures using an angle resolved polarized scatterometer: ASML YieldStar [1]. In this paper, the exercise was extended to several different structures combining multiple line-end gap situations. Systematic comparison with CD-SEM is performed and discussed. Lithographic behavior of the main parameters is analyzed. Strengths and limits of the technique will be shown. Once validated, the metrology is used to build an OPC model and correct our test vehicle.

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A.-L. Charley, M. Dusa, T.-B. Chiou, P. Leray, S. Cheng, and A. Fumar-Pici "Line-end gap measurement with YieldStar scatterometer: towards an OPC model calibration", Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83242I (5 April 2012); https://doi.org/10.1117/12.918028

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