20 March 2012 The saga of lambda: spectral influences throughout lithography generations
Author Affiliations +
Abstract
In this paper, the progression of optical lithography from a spectral (or wavelength) perspective is presented. The interdependencies between materials, sources, design challenges, and scaling are described relative the needs of semiconductor device generations. Comparisons of materials and approaches for use in the blue-UV, the mid-UV, the deep-UV, and to EUV wavelengths are provided showing the spectral influences for choices made. Inorganic and organic lithography materials, sources of radiation, and incremental wavelength "shrink" are compared for lithography generations from g-line to EUV and beyond.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruce W. Smith, "The saga of lambda: spectral influences throughout lithography generations", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83250Z (20 March 2012); doi: 10.1117/12.920025; https://doi.org/10.1117/12.920025
PROCEEDINGS
9 PAGES


SHARE
Back to Top