20 March 2012 Stable, fluorinated acid amplifiers for use in EUV lithography
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Abstract
This paper presents two new concepts that together provide a 100,000X improvement in stability for AAs that produce highly-fluorinated, strong sulfonic acids. These two new design concepts are based on (1) an olefin-trigger structure and (2) a trifluoromethyl group alpha to the sulfonic ester. These new concepts led to the synthesis of the first stable acid amplifier that generates triflate acid and for the synthesis of AAs that are stable enough to be used as monomers in free-radical polymerization reactions yet produce very strong, fluorinated acids. Lastly, we present preliminary results where one new AA is able to improve the LER of a control resist from 4.6 ± 0.5 nm to 2.1 ± 0.1 nm.
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Seth Kruger, Seth Kruger, Kenji Hosoi, Kenji Hosoi, Brian Cardineau, Brian Cardineau, Koichi Miyauchi, Koichi Miyauchi, Robert Brainard, Robert Brainard, } "Stable, fluorinated acid amplifiers for use in EUV lithography", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 832514 (20 March 2012); doi: 10.1117/12.917015; https://doi.org/10.1117/12.917015
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