19 March 2012 Investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists
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Abstract
In this paper, we report the investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists based on calix[4]resorcinarene (CRA) by Electron Beam Lithography (EBL). The sensitivity of negative-tone molecular resists were higher as the value of the Octanol water partition coefficient got smaller. It was confirmed that the octanol water partition coefficient was useful to the guess of sensitivity of negativetone molecular resists. Furthermore, we have developed calix[4]resorcinarenes showing well-defined sub 20nm halfpitch patterns.
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Masatoshi Echigo, Masatoshi Echigo, Masako Yamakawa, Masako Yamakawa, Yumi Ochiai, Yumi Ochiai, Yu Okada, Yu Okada, Masaaki Takasuka, Masaaki Takasuka, } "Investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251G (19 March 2012); doi: 10.1117/12.916145; https://doi.org/10.1117/12.916145
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