19 March 2012 Positive-tone chemically amplified fullerene resist
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Abstract
With continuing efforts to achieve higher lithographic resolution there has been on-going interest in the development of low molecular weight resists, such as molecular glasses. Here we present the initial results of a study into the development of a positive tone two component chemically amplified resist based on methanofullerene derivatives (MF) with acid labile groups (tert-butyl acetate (tBAC); tert-butoxycarbonyl (tBOC)). Mono, di, tris and hexa adducts of MFtBAC together with mono and di adducts of MF-tBOC have been evaluated with several photoacid generators. Sensitivities as high as 11 μC/cm2 have been achieved in some cases and sub-100 nm features have been patterned.
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J. Manyam, A. Frommhold, D. X. Yang, A. McClelland, M. Manickam, J. A. Preece, R. E. Palmer, A. P. G. Robinson, "Positive-tone chemically amplified fullerene resist", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251U (19 March 2012); doi: 10.1117/12.916472; https://doi.org/10.1117/12.916472
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