Reduced Zeta potential through use of cationic adhesion promoter for improved resist process performance and minimizing material consumption

Lorna Hodgson; Andrew Thompson

doi:10.1117/12.917856

19 March 2012 Reduced Zeta potential through use of cationic adhesion promoter for improved resist process performance and minimizing material consumption

Lorna Hodgson, Andrew Thompson

Author Affiliations +

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83251W (2012) https://doi.org/10.1117/12.917856
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

This paper presents the results of a non-HMDS (non-silane) adhesion promoter that was used to reduce the zeta potential for very thin (proprietary) polymer on silicon. By reducing the zeta potential, as measured by the minimum sample required to fully coat a wafer, the amount of polymer required to coat silicon substrates was significantly reduced in the manufacture of X-ray windows used for high transmission of low-energy X-rays. Moreover, this approach used aqueous based adhesion promoter described as a cationic surface active agent that has been shown to improve adhesion of photoresists (positive, negative, epoxy [SU8], e-beam and dry film). As well as reducing the amount of polymer required to coat substrates, this aqueous adhesion promoter is nonhazardous, and contains non-volatile solvents.

Citation Download Citation

Lorna Hodgson and Andrew Thompson "Reduced Zeta potential through use of cationic adhesion promoter for improved resist process performance and minimizing material consumption", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251W (19 March 2012); https://doi.org/10.1117/12.917856

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