An effective filter start-up method has been required by device manufacturers, mainly in order to reduce waste volume of
lithography process chemicals, which become more expensive as lithography technology advances. Remaining air was
monitored during static-pressure-driven filter start-up. As a result, 3500 ml of the resist was needed to eliminate
remaining air. For improvement, cyclohexanone pre-wetting was applied prior to the resist introduction. As a result, the
resist volume needed for the solvent displacement was 1900 ml, approximately half the volume required for staticpressure-
driven start-up. Other solvents were evaluated for the pre-wetting start-up method. Results, in descending
order of performance were PGME (best) < PGMEA = IPA < cyclohexanone (worst). Moreover, air displacement
performance strongly correlated with Hansen solubility parameter distance between each solvent and nylon 6,6 material.