Effects of nylon filter properties on contact-hole photoresist imaging performance and defectivity

M. Cronin; N. Vitorino; V. Monreal; J. Zook

doi:10.1117/12.916508

19 March 2012 Effects of nylon filter properties on contact-hole photoresist imaging performance and defectivity

M. Cronin, N. Vitorino, V. Monreal, J. Zook

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83252M (2012) https://doi.org/10.1117/12.916508
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Previous studies of contact-hole photoresist-performance¹ with various filter membranes demonstrated that UPE (ultra high molecular weight polyethylene) membranes are effective in reducing defectivity with minimal changes in the resist's imaging properties. In the same study, nylon membrane filters, known to have absorptive properties, altered the lithographic imaging performance of the photoresist and produced higher overall defectivity. This study more closely examines the absorption effects of nylon membrane on contact hole photoresist and attempts to quantify changes to the photoresist by measuring the change in lithographic performance, and its' effect on defectivity. Additionally, this study provides recommendations on the filtration parameters which take advantage of the absorptive capability of the nylon membrane, while minimizing the changes to the lithographic performance of the photoresist.

Citation Download Citation

M. Cronin, N. Vitorino, V. Monreal, and J. Zook "Effects of nylon filter properties on contact-hole photoresist imaging performance and defectivity", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83252M (19 March 2012); https://doi.org/10.1117/12.916508

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