Mutual source, mask and projector pupil optimization

Tim Fühner; Peter Evanschitzky; Andreas Erdmann

doi:10.1117/12.916529

13 March 2012 Mutual source, mask and projector pupil optimization

Tim Fühner, Peter Evanschitzky, Andreas Erdmann

Proceedings Volume 8326, Optical Microlithography XXV; 83260I (2012) https://doi.org/10.1117/12.916529
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

This paper presents a combined source/mask/projector pupil optimization (SMPO) procedure, aiming at the maximization of the common process window of different line/space configurations. The parameters are given by a pixelated source representation, sizes of the main features and the SRAF configuration. The projector wavefront is varied through the coefficients of the Fringe/Zernike polynomials for spherical aberrations. A genetic algorithm is applied as the underlying optimization algorithm. A number of results are presented and discussed, demonstrating the feasibility and potentials of the approach.

Citation Download Citation

Tim Fühner, Peter Evanschitzky, and Andreas Erdmann "Mutual source, mask and projector pupil optimization", Proc. SPIE 8326, Optical Microlithography XXV, 83260I (13 March 2012); https://doi.org/10.1117/12.916529

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