13 March 2012 Impact of non-uniform polarized illumination on hyper-NA lithography
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Conventional top-hat model of polarized illumination loses its accuracy in lithography simulation which cannot meet the requirements of 45nm node lithography and beyond. The simulation error of top-hat model in evaluating lithography performance cannot be neglected anymore. In this paper, we apply a Gaussian model to represent the non-uniform degree of polarization (NU-DOP) distribute across the pupil and evaluate its impact on the CD uniformity under various conditions. The result shows that the model can accurately evaluate the non-uniform property of polarized illuminator. When the mean NU-DOP approaches to 1, the effect of non-uniformity becomes more pronounced. Furthermore, the non-uniform of DOP distribution causes more CD error at defocus position.
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Xuejia Guo, Xuejia Guo, Yanqiu Li, Yanqiu Li, "Impact of non-uniform polarized illumination on hyper-NA lithography", Proc. SPIE 8326, Optical Microlithography XXV, 832623 (13 March 2012); doi: 10.1117/12.916307; https://doi.org/10.1117/12.916307

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