13 March 2012 Three-dimensional polarization aberration in hyper-numerical aperture lithography optics
Author Affiliations +
Abstract
Polarization aberration is usually represented by Jones pupil with two-dimensional (2D) format in local coordinate system. People transform the 2D polarization aberration into global coordinate system for three-dimensional (3D) imaging simulation by using mathematical coordinate transformation, rather than 3D polarization aberration defined by physics, which results in a lack of precision of 3D imaging simulation. In this paper, a new representation of 3D polarization aberration is introduced. Then the 3D polarization aberration of a hyper-NA lithography optics is extracted that is available to precisely describe the polarization properties of the optics and evaluate the 3D vector imaging performance without additional mathematical coordinate transformation. 3D polarization aberration of this paper avoids the errors of transforming 2D polarization aberration into global coordinate system mathematically.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jingmin Wang, Jingmin Wang, Yanqiu Li, Yanqiu Li, "Three-dimensional polarization aberration in hyper-numerical aperture lithography optics", Proc. SPIE 8326, Optical Microlithography XXV, 832624 (13 March 2012); doi: 10.1117/12.916299; https://doi.org/10.1117/12.916299
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT

Mechanics of polarization ray tracing
Proceedings of SPIE (December 10 1992)
Progress in polarization ray tracing
Proceedings of SPIE (September 13 1994)
The capability of a 1.3 NA μstepper using 3D EMF...
Proceedings of SPIE (March 20 2006)

Back to Top