13 March 2012 High hydrophobic topcoat approach for high volume production and yield enhancement of immersion lithography
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Abstract
Immersion scanner performance is being improved generation by generation. Faster scan speed is required to increase scanner productivity. There are, however, several papers reporting defect increase with higher scan speed1, 2, 3. To overcome this challenge, both material and immersion scanner requires special tuning and optimization. This high stage speed is possible by employing topcoats that have higher hydrophobicity. In general, blob defect are generated at a higher rate with increase in hydrophobicity of topcoat. Nikon and JSR have collaborated to address this challenge by using next generation scanner and a newly developed topcoat material, respectively. JSR, as a topcoat supplier, introduces a new topcoat (TCX279), which shows low blob defects even with very high hydrophobicity. Nikon's latest immersion scanner S621D, equipped with latest nozzle design for optimizing immersion water flow, and an improved tandem stage system to reduce edge particles, resulted in achieving 5x defect reduction compared to S620D. Ultimately, zero immersion defects were realized by a combination of Nikon's S621D scanner and JSR's new topcoat, TCX279.
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Natsuko Sagawa, Katsushi Nakano, Yuuki Ishii, Kazunori Kusabiraki, Motoyuki Shima, "High hydrophobic topcoat approach for high volume production and yield enhancement of immersion lithography", Proc. SPIE 8326, Optical Microlithography XXV, 832627 (13 March 2012); doi: 10.1117/12.916271; https://doi.org/10.1117/12.916271
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