OPC modeling has been complex procedure in 28nm node, and it becomes difficult to obtain enough OPC modeling
accuracy if calibration is done by using only CD value. Therefore it becomes essential to take pattern shape variation into
consideration especially in 2D pattern calibration. Thus utilizing SEM-contour has become important technology.
In SPIE advanced lithograpy 2010 , Contour-based OPC-modeling by using Advanced SEM-contour which is
combined with Fine SEM Edge, alignment and averaging technologies was examined, and model quality was
significantly improved. Also, in SPIE advanced lithography 2011, an advanced hybrid OPC modeling which uses 1D CD
measurements by CD-SEM and 2D contours created by the advanced SEM-contouring technology and panoramic Mask
SEM-contour showed high predictability for both 1D and 2D, even though the relationship between 1D and 2D
calibration has trade-off.
In this study, weighing function of Calibre ContourCal, a product of Mentor Graphics, was evaluated using the OPC data
set same as that used in SPIE2011. The weighting can be set for 1D structure and 2D structure separately. In this paper,
the quality of OPC model by applying different weighting is discussed.