15 March 2012 Pattern matching for double patterning technology-compliant physical design flows
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Proceedings Volume 8327, Design for Manufacturability through Design-Process Integration VI; 832708 (2012); doi: 10.1117/12.916581
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States
Abstract
A pattern-based methodology for guiding the generation of DPT-compliant layouts using a foundry-characterized library of "difficult to decompose" patterns with known corresponding solutions is presented. A pattern matching engine scans the drawn layout for patterns from the pattern library. If a match were found, one or more DPT-compliant solutions would be provided for guiding the layout modifications. This methodology is demonstrated on a sample 1.8 mm2 layout migrated from a previous technology. A small library of 12 patterns is captured, which accounts for 59 out of the 194 DPT-compliance check violations examined. In addition, the methodology can be used to recommend specific changes to the original drawn design to improve manufacturability. This methodology is compatible with any physical design flows that use automated decomposition algorithms.
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Lynn T.-N. Wang, Vito Dai, Luigi Capodieci, "Pattern matching for double patterning technology-compliant physical design flows", Proc. SPIE 8327, Design for Manufacturability through Design-Process Integration VI, 832708 (15 March 2012); doi: 10.1117/12.916581; https://doi.org/10.1117/12.916581
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KEYWORDS
Double patterning technology

Manufacturing

Design for manufacturability

Resolution enhancement technologies

Lithography

Feature extraction

Optical proximity correction

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