15 March 2012 Overlay, decomposition and synthesis methodology for hybrid self-aligned triple and negative-tone double patterning
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Proceedings Volume 8327, Design for Manufacturability through Design-Process Integration VI; 83270N (2012); doi: 10.1117/12.916495
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States
Abstract
A hybrid self-aligned triple and negative-tone double patterning (HTDP) technique is proposed to achieve improved resolution and quasi-2D IC design flexibility at lower cost. Critical challenges of HTDP process and its key design issues such as overlay, layout decomposition and synthesis are investigated, and possible design solutions are discussed. It is shown that using mandrel (including assisting mandrel) and spacer engineering, HTDP on-grid layout design is a promising approach to break the limitation of 1-D gridded design. Efficient formulation of HTDP layout decomposition/synthesis into a Boolean satisfactory problem is demonstrated. Moreover, by considering geometric constraints of HTDP layout and several process related assumptions, it is possible to significantly reduce the number of layout features and Boolean input variables. Several examples of 2-D layout are used to demonstrate the process of HTDP decomposition/synthesis, as well as the simplification of its algorithm to reduce runtime. Specifically, preliminary results from implementation of a 2-mask HTDP design for patterning a 2-D dense line/space array with pads are reported.
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Weiling Kang, Yijian Chen, "Overlay, decomposition and synthesis methodology for hybrid self-aligned triple and negative-tone double patterning", Proc. SPIE 8327, Design for Manufacturability through Design-Process Integration VI, 83270N (15 March 2012); doi: 10.1117/12.916495; https://doi.org/10.1117/12.916495
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KEYWORDS
Photomasks

Optical lithography

Double patterning technology

Silicon

Image processing

Oxides

Etching

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