16 April 2012 Mask readiness for EUVL pilot line
Author Affiliations +
Proceedings Volume 8352, 28th European Mask and Lithography Conference; 835204 (2012) https://doi.org/10.1117/12.923125
Event: 28th European Mask and Lithography Conference (EMLC 2012), 2012, Dresden, Germany
Abstract
EUVL pilot line will be launched in 2012 with several pre-production tools installed in world wide. Since there will be still the productivity issue on the exposure tool, certain demand of EUV masks may be required in 2012. In this presentation, the status of EUV mask readiness, such as pattern quality, related infrastructures, and mask handling flow etc., will be discussed.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Naoya Hayashi, Naoya Hayashi, Tsukasa Abe, Tsukasa Abe, Tadahiko Takikawa, Tadahiko Takikawa, } "Mask readiness for EUVL pilot line", Proc. SPIE 8352, 28th European Mask and Lithography Conference, 835204 (16 April 2012); doi: 10.1117/12.923125; https://doi.org/10.1117/12.923125
PROCEEDINGS
5 PAGES


SHARE
RELATED CONTENT

SEMATECH EUVL mask program status
Proceedings of SPIE (May 11 2009)
Overview of SEMATECH's EUVL program
Proceedings of SPIE (June 16 2005)
NGL masks: development status and issue
Proceedings of SPIE (April 01 2011)
EUV mask infrastructure challenges
Proceedings of SPIE (May 03 2007)

Back to Top