Paper
16 April 2012 MEMS: fabrication of cryogenic bolometers
J. Kunert, S. Anders, T. May, V. Zakosarenko, G. Zieger, E. Kreysa, H.-G. Meyer
Author Affiliations +
Proceedings Volume 8352, 28th European Mask and Lithography Conference; 83520F (2012) https://doi.org/10.1117/12.923707
Event: 28th European Mask and Lithography Conference (EMLC 2012), 2012, Dresden, Germany
Abstract
Cryogenic bolometers are among the most sensitive devices for the detection of electromagnetic radiation in the submillimeter wavelength range. Such radiation is of interest for astronomical observations as well as for security checks. We describe how we fabricate an array of these bolometers. Standard contact lithography is sufficient for these relatively coarse features. To increase the sensitivity, it is imperative to weaken the thermal link between the thermistors (the sensing devices) and the temperature bath. This is achieved by placing them on a silicon nitride membrane that is structured so that the thermistors are placed on a platform which is held only by a few beams. The fabrication process does not require sophisticated lithographic techniques, but special care to achieve the desired yield of 100 % intact bolometers in one array. We discuss bolometer basics and requirements for our applications, critical fabrication issues, and show results of complete systems built for a radio telescope and for security cameras.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Kunert, S. Anders, T. May, V. Zakosarenko, G. Zieger, E. Kreysa, and H.-G. Meyer "MEMS: fabrication of cryogenic bolometers", Proc. SPIE 8352, 28th European Mask and Lithography Conference, 83520F (16 April 2012); https://doi.org/10.1117/12.923707
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KEYWORDS
Bolometers

Semiconducting wafers

Cryogenics

Video

Silicon

Microelectromechanical systems

Astronomy

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