16 April 2012 Phase-shift at subwavelength holographic lithography (SWHL)
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Proceedings Volume 8352, 28th European Mask and Lithography Conference; 83520P (2012) https://doi.org/10.1117/12.918016
Event: 28th European Mask and Lithography Conference (EMLC 2012), 2012, Dresden, Germany
Abstract
Authors of the report have been developing sub-wavelength holographic lithography (SWHL) methods of aerial image creation for IC layer topologies for the last several years. Sub-wave holographic masks (SWHM) have a number of substantial advantages in comparison with the traditional masks, which are used in projection photo-microlithography. The main advantage is the tolerance of SWHM to local defects. This tolerance allows considerable reduction of manufacturing environment and post-production verification requirements. At the report we are also going to consider another important advantage of the SWHL technology. In order to achieve sub-wavelength resolution in this technology it is enough just to alter the number, sizes and positions of transparency areas on the SWHM. There is no need in coating the mask with one- or multi-layer highly-local phase-shifting coat or creating of local phase-shifting structural elements, which is usual for traditional lithography. Introducing of the object wave with the specified phase-shift into the calculation is enough. Our research shows that such approach could be applied to the creation of the test structures as well as to the creation of the real IC layer topologies.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mikhail V. Borisov, Mikhail V. Borisov, Dmitriy A. Chelyubeev, Dmitriy A. Chelyubeev, Vitalij V. Chernik, Vitalij V. Chernik, Alexander A. Gavrikov, Alexander A. Gavrikov, Dmitriy Yu. Knyazkov, Dmitriy Yu. Knyazkov, Petr A. Mikheev, Petr A. Mikheev, Vadim I. Rakhovsky, Vadim I. Rakhovsky, Alexey S. Shamaev, Alexey S. Shamaev, } "Phase-shift at subwavelength holographic lithography (SWHL)", Proc. SPIE 8352, 28th European Mask and Lithography Conference, 83520P (16 April 2012); doi: 10.1117/12.918016; https://doi.org/10.1117/12.918016
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