Mercury cadmium telluride (HgCdTe) passivation by advanced thin conformal Al2O3 films

Richard Fu; James Pattison; Andrew Chen; Osama Nayfeh

doi:10.1117/12.918605

31 May 2012 Mercury cadmium telluride (HgCdTe) passivation by advanced thin conformal Al₂O₃ films

Richard Fu, James Pattison, Andrew Chen, Osama Nayfeh

Proceedings Volume 8353, Infrared Technology and Applications XXXVIII; 83532I (2012) https://doi.org/10.1117/12.918605
Event: SPIE Defense, Security, and Sensing, 2012, Baltimore, Maryland, United States

Abstract

HgCdTe passivation process must be performed at low temperature in order to reduce Hg depletion. Low temperature plasma enhanced atomic layer deposition (PE-ALD) is an emerging deposition technology for thin highly conformal films to meet the demand. Room temperature PE-ALD Al₂O₃ film's passivation on HgCdTe has been studied. Conformal film was investigated through SEM images of the Al₂O₃ film deposited onto high aspect ratio features dry etched into HgCdTe. Minority carrier lifetime was measured and compared by photoconductive decay transients of HgCdTe before and after deposition. Room temperature ALD Al₂O₃ film increased the minority carrier lifetime of HgCdTe.

Citation Download Citation

Richard Fu, James Pattison, Andrew Chen, and Osama Nayfeh "Mercury cadmium telluride (HgCdTe) passivation by advanced thin conformal Al₂O₃ films", Proc. SPIE 8353, Infrared Technology and Applications XXXVIII, 83532I (31 May 2012); https://doi.org/10.1117/12.918605

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