16 October 2012 Supersmooth polishing with sub-angstron roughness
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Proceedings Volume 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 841609 (2012); doi: 10.1117/12.975832
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
Numerical-controlled (NC) micro-jet supersmooth polishing technology is a new non-contacting polishing method developed on the base of the float-polishing. In this paper, both the theory and the techniques about this new polishing technology are introduced in detail, and the surface of fused silica was polished, white-light interferometer (WLI) and atomic force microscope (AFM) were used to measure the evolutions of waveness and roughness during the fabricating process. No new scratches were produced when the nanoparticles removed the atoms away from the surface. The roughness decreased monotonously with the removal of subsurface damage layer. And ideal supersmooth surface without scratches was achieved with waveness less than 0.2nmrmsRMS while the high-spatial frequency roughness less than 0.1nmrmsRMS (sub-angstron).
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Junlin Wang, "Supersmooth polishing with sub-angstron roughness", Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 841609 (16 October 2012); doi: 10.1117/12.975832; http://dx.doi.org/10.1117/12.975832
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KEYWORDS
Polishing

Surface finishing

Nanoparticles

Silica

Atomic force microscopy

Microfluidics

Polishing equipment

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